Title :
Design For Manufacturing (DFM) in Nano-CMOS era
Author_Institution :
SHRIME, Peking Univ., Shanghai
Abstract :
This paper overviews DFM for IC design in nano-CMOS technologies. Process/device issues relevant to the manufacturability of ICs in advanced CMOS technologies will be presented first before an exploration on process/device modeling for DFM is done. The discussion also covers a brief introduction of DFM-aware of design flow and EDA efforts to better handle the design-manufacturing interface in very large scale IC design environment.
Keywords :
CMOS integrated circuits; design for manufacture; integrated circuit design; integrated circuit manufacture; integrated circuit modelling; nanoelectronics; semiconductor device manufacture; IC design; design-manufacturing interface; manufacturing design; nanoCMOS; process-device modeling; Design for manufacture; Manufacturing; Nanoelectronics;
Conference_Titel :
Nanoelectronics Conference, 2008. INEC 2008. 2nd IEEE International
Conference_Location :
Shanghai
Print_ISBN :
978-1-4244-1572-4
Electronic_ISBN :
978-1-4244-1573-1
DOI :
10.1109/INEC.2008.4585541
