A new semiconductor research paradigm using Internet collaboration

Author

Losleben, Paul ; Boning, Duane S.

Author_Institution

Stanford Nanofabrication Facility, Stanford Univ., CA, USA

fYear

1996

fDate

2-4 Sept. 1996

Firstpage

9

Lastpage

12

Abstract

Continued progress in semiconductor process and device research will require new modes of collaboration and interaction. Internet technology will play a large role in creating and supporting a new distributed community of researchers. Stanford and MIT are working together to explore several elements of emerging networking technology in the context of semiconductor research. These elements include a help system, fabrication facilities database, a Collaboratory, networked process repository, remote simulation, remote process execution, remote microscope, and electronic technical publication and repositories.

Keywords

Internet; distributed databases; electronic engineering computing; electronic publishing; research initiatives; teleworking; Collaboratory; Internet collaboration; device research; distributed research community; electronic technical publication; fabrication facilities database; help system; interaction; networked process repository; networking technology; remote microscope; remote process execution; remote simulation; semiconductor research paradigm; Collaboration; Collaborative work; Consumer electronics; Databases; Fabrication; Internet; Laboratories; Libraries; Nanofabrication; Plasmas;

fLanguage

English

Publisher

ieee

Conference_Titel

Simulation of Semiconductor Processes and Devices, 1996. SISPAD 96. 1996 International Conference on

Print_ISBN

0-7803-2745-4

Type

conf

DOI

10.1109/SISPAD.1996.865249

Filename

865249