DocumentCode :
2367585
Title :
An interpolation technique for the numerical solution of the rate equations in extended defect simulation
Author :
Dokumaci, Omer ; Law, Mark E.
Author_Institution :
Dept. of Electr. & Comput. Eng., Florida Univ., Gainesville, FL, USA
fYear :
1996
fDate :
2-4 Sept. 1996
Firstpage :
37
Lastpage :
38
Abstract :
Extended defects play an important role in the diffusion and electrical activation of dopants in silicon. All extended defects have been observed to have a range of sizes. The evolution of the size distribution can be calculated through a series of discrete rate equations. Since the extended defects can contain millions of atoms, the number of rate equations can become so large that it will be impossible to solve all of them. In this paper, we compare three different methods of reducing the number of equations for extended defect simulation: Linear interpolation, exponential interpolation, and linear rediscretization.
Keywords :
elemental semiconductors; impurity-defect interactions; interpolation; silicon; Si; diffusion; dopant; electrical activation; exponential interpolation; extended defect simulation; linear interpolation; linear rediscretization; numerical method; rate equation; silicon; size distribution; Computational modeling; Computer simulation; Differential equations; Electron devices; Interpolation; Ion implantation; Object oriented modeling; Silicon;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Simulation of Semiconductor Processes and Devices, 1996. SISPAD 96. 1996 International Conference on
Print_ISBN :
0-7803-2745-4
Type :
conf
DOI :
10.1109/SISPAD.1996.865262
Filename :
865262
Link To Document :
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