• DocumentCode
    2367585
  • Title

    An interpolation technique for the numerical solution of the rate equations in extended defect simulation

  • Author

    Dokumaci, Omer ; Law, Mark E.

  • Author_Institution
    Dept. of Electr. & Comput. Eng., Florida Univ., Gainesville, FL, USA
  • fYear
    1996
  • fDate
    2-4 Sept. 1996
  • Firstpage
    37
  • Lastpage
    38
  • Abstract
    Extended defects play an important role in the diffusion and electrical activation of dopants in silicon. All extended defects have been observed to have a range of sizes. The evolution of the size distribution can be calculated through a series of discrete rate equations. Since the extended defects can contain millions of atoms, the number of rate equations can become so large that it will be impossible to solve all of them. In this paper, we compare three different methods of reducing the number of equations for extended defect simulation: Linear interpolation, exponential interpolation, and linear rediscretization.
  • Keywords
    elemental semiconductors; impurity-defect interactions; interpolation; silicon; Si; diffusion; dopant; electrical activation; exponential interpolation; extended defect simulation; linear interpolation; linear rediscretization; numerical method; rate equation; silicon; size distribution; Computational modeling; Computer simulation; Differential equations; Electron devices; Interpolation; Ion implantation; Object oriented modeling; Silicon;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Simulation of Semiconductor Processes and Devices, 1996. SISPAD 96. 1996 International Conference on
  • Print_ISBN
    0-7803-2745-4
  • Type

    conf

  • DOI
    10.1109/SISPAD.1996.865262
  • Filename
    865262