DocumentCode
2367585
Title
An interpolation technique for the numerical solution of the rate equations in extended defect simulation
Author
Dokumaci, Omer ; Law, Mark E.
Author_Institution
Dept. of Electr. & Comput. Eng., Florida Univ., Gainesville, FL, USA
fYear
1996
fDate
2-4 Sept. 1996
Firstpage
37
Lastpage
38
Abstract
Extended defects play an important role in the diffusion and electrical activation of dopants in silicon. All extended defects have been observed to have a range of sizes. The evolution of the size distribution can be calculated through a series of discrete rate equations. Since the extended defects can contain millions of atoms, the number of rate equations can become so large that it will be impossible to solve all of them. In this paper, we compare three different methods of reducing the number of equations for extended defect simulation: Linear interpolation, exponential interpolation, and linear rediscretization.
Keywords
elemental semiconductors; impurity-defect interactions; interpolation; silicon; Si; diffusion; dopant; electrical activation; exponential interpolation; extended defect simulation; linear interpolation; linear rediscretization; numerical method; rate equation; silicon; size distribution; Computational modeling; Computer simulation; Differential equations; Electron devices; Interpolation; Ion implantation; Object oriented modeling; Silicon;
fLanguage
English
Publisher
ieee
Conference_Titel
Simulation of Semiconductor Processes and Devices, 1996. SISPAD 96. 1996 International Conference on
Print_ISBN
0-7803-2745-4
Type
conf
DOI
10.1109/SISPAD.1996.865262
Filename
865262
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