• DocumentCode
    2367645
  • Title

    Full-band Monte Carlo simulation of high-energy transport and impact ionization of electrons and holes in Ge, Si, and GaAs

  • Author

    Fischetti, M.V. ; Sano, N. ; Laux, S.E. ; Natori, K.

  • Author_Institution
    IBM Thomas J. Watson Res. Center, Yorktown Heights, NY, USA
  • fYear
    1996
  • fDate
    2-4 Sept. 1996
  • Firstpage
    43
  • Lastpage
    44
  • Abstract
    In this work we have computed the rate for impact ionization ab initio and have employed this rate in full-band Monte Carlo simulations in order to determine the high-energy carrier-phonon deformation potentials. We have considered transport and impact ionization of electrons and holes in Ge, Si, and GaAs, the valence bands being treated with nonlocal empirical pseudopotentials and spin-orbit interaction. The impact ionization rates have been computed using three different approximations: (1) the ab initio rate, which accounts for energy and momentum conservation and for the dependence of the Coulomb matrix element on both initial and final states, (2) the constant-matrix-element (CME) approximation, which employee a constant Coulomb matrix element, and (3) the random-k approximation, which relaxes momentum-conservation.
  • Keywords
    III-V semiconductors; Monte Carlo methods; electron-phonon interactions; elemental semiconductors; gallium arsenide; germanium; impact ionisation; pseudopotential methods; silicon; spin-orbit interactions; Coulomb matrix element; GaAs; Ge; Si; ab initio rate; carrier-phonon deformation potential; constant-matrix-element approximation; full-band Monte Carlo simulation; high-energy transport; impact ionization; nonlocal empirical pseudopotential; random-k approximation; spin-orbit interaction; valence band; Calibration; Charge carrier processes; Computational modeling; Data mining; Deformable models; Electrons; Gallium arsenide; Impact ionization; Monte Carlo methods; Physics;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Simulation of Semiconductor Processes and Devices, 1996. SISPAD 96. 1996 International Conference on
  • Print_ISBN
    0-7803-2745-4
  • Type

    conf

  • DOI
    10.1109/SISPAD.1996.865265
  • Filename
    865265