Title :
Energy transport modeling of graded AlGaAs/GaAs HBTs: importance of giving adequate transport parameters
Author :
Okada, K. ; Nakatani, A. ; Horio, K.
Author_Institution :
Fac. of Syst. Eng., Shibaura Inst. of Technol., Omiya, Japan
Abstract :
AlGaAs/GaAs HBTs have received great interest for applications to high-speed and high-frequency devices and ICs. Since nonequilibrium carrier transport becomes important in the HBTs, carrier energy must be considered in the modeling of them. For this purpose, an energy transport model that uses hydrodynamic equations derived from the Boltzmann equation is attractive and has been applied to AlGaAs/GaAs HBTs. In the HBTs, material parameters should depend on material composition as well as carrier energy and the doping densities. However, up to now, methods of giving parameters in the transport equations were too crude. A constant value of energy relaxation time was assumed and parameters for GaAs at a certain doping density were also assumed for all x in AlxGa1-xAs. In this work, a method of giving composition-, doping-, and energy-dependent transport parameters is proposed, and successfully applied to the simulation of AlGaAs/GaAs HBTs.
Keywords :
Boltzmann equation; III-V semiconductors; aluminium compounds; carrier mobility; doping profiles; gallium arsenide; heterojunction bipolar transistors; semiconductor device models; semiconductor doping; AlGaAs-GaAs; Boltzmann equation; HBTs; carrier energy; composition-dependent transport parameters; doping densities; doping-dependent transport parameters; energy relaxation time; energy transport modeling; energy-dependent transport parameters; high-frequency devices; high-speed devices; hydrodynamic equations; material composition; nonequilibrium carrier transport; transport parameters; Composite materials; Delay estimation; Doping; Electron mobility; Equations; Gallium arsenide; Heterojunction bipolar transistors; Power engineering and energy; Semiconductor process modeling; Systems engineering and theory;
Conference_Titel :
Simulation of Semiconductor Processes and Devices, 1996. SISPAD 96. 1996 International Conference on
Print_ISBN :
0-7803-2745-4
DOI :
10.1109/SISPAD.1996.865269