DocumentCode :
2367795
Title :
An anomalous correlation between gate leakage current and threshold voltage fluctuation in advanced MOSFETs
Author :
Liu, Zihong ; Chang, Paul ; Yu, Xiaojun ; Deng, Jie ; Han, Shu-Jen ; Shahidi, Ghavam ; Haensch, Wilfried ; Rim, Ken
Author_Institution :
T.J. Watson Res. Center, IBM, Yorktown Heights, NY, USA
fYear :
2010
fDate :
6-8 Dec. 2010
Abstract :
An anomalous correlation of gate leakage current and threshold voltage fluctuation in aggressively scaled MOSFETs is revealed and analyzed by statistical technique and a corresponding physical model is proposed. For a range of threshold voltage (Vt) design, gate leakage at fixed gate and drain bias increases with Vt before it decreases at higher Vt. The behavior can be accurately explained by a trade-off between two mechanisms (“two reversed functions”): Vt roll-off effect and gate leakage current density dependence on surface potential.
Keywords :
MOSFET; leakage currents; statistical analysis; MOSFET; gate leakage current; statistical technique; threshold voltage fluctuation;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting (IEDM), 2010 IEEE International
Conference_Location :
San Francisco, CA
ISSN :
0163-1918
Print_ISBN :
978-1-4424-7418-5
Electronic_ISBN :
0163-1918
Type :
conf
DOI :
10.1109/IEDM.2010.5703291
Filename :
5703291
Link To Document :
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