• DocumentCode
    2367795
  • Title

    An anomalous correlation between gate leakage current and threshold voltage fluctuation in advanced MOSFETs

  • Author

    Liu, Zihong ; Chang, Paul ; Yu, Xiaojun ; Deng, Jie ; Han, Shu-Jen ; Shahidi, Ghavam ; Haensch, Wilfried ; Rim, Ken

  • Author_Institution
    T.J. Watson Res. Center, IBM, Yorktown Heights, NY, USA
  • fYear
    2010
  • fDate
    6-8 Dec. 2010
  • Abstract
    An anomalous correlation of gate leakage current and threshold voltage fluctuation in aggressively scaled MOSFETs is revealed and analyzed by statistical technique and a corresponding physical model is proposed. For a range of threshold voltage (Vt) design, gate leakage at fixed gate and drain bias increases with Vt before it decreases at higher Vt. The behavior can be accurately explained by a trade-off between two mechanisms (“two reversed functions”): Vt roll-off effect and gate leakage current density dependence on surface potential.
  • Keywords
    MOSFET; leakage currents; statistical analysis; MOSFET; gate leakage current; statistical technique; threshold voltage fluctuation;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting (IEDM), 2010 IEEE International
  • Conference_Location
    San Francisco, CA
  • ISSN
    0163-1918
  • Print_ISBN
    978-1-4424-7418-5
  • Electronic_ISBN
    0163-1918
  • Type

    conf

  • DOI
    10.1109/IEDM.2010.5703291
  • Filename
    5703291