DocumentCode :
2367862
Title :
The Second Stage of a Thin Wafer IGBT Low Loss 1200V LPT-CSTBT ™ with a Backside Doping Optimization Process
Author :
Nakamura, K. ; Hisamoto, Y. ; Matsumura, T. ; Minato, Tsuneaki ; Moritani, J.
Author_Institution :
Power Device Works, Mitsubishi Electr. Corp., Fukuoka
fYear :
2006
fDate :
4-8 June 2006
Firstpage :
1
Lastpage :
4
Abstract :
We have done research for the purpose of improving of total performance of 1200V light punch-through (LPT) IGBTs that utilizing carrier stored trench-gate bipolar transistor (CSTBTtrade). This paper reports that the total loss can be dramatically improved by a vertical shrink of LPT-CSTBT to a structure with a thin N drift and a new backside collector layer possessed of both reinforced N buffer and lengthened carrier lifetime. The new LPT-CSTBT demonstrates lower on-state voltage (VCE(sat)), lower turn-off loss (EOFF ), lower junction leakage current (@398 ~ 423K) than that of the conventional one presented in ISPSD´02. Our results show, for the first time, that the proposed new collector structure is much more effective as a collector one because of making it positive to choose any position in the trade-off characteristic between VCE(sat) and EOFF without utilizing any conventional carrier lifetime technique. From the viewpoint of low total loss and choosing widely characteristic position in the VCE(sat) and EOFF trade-off curve, the new LPT-CSTBT with new LPT technology is a promising candidate for high voltage power device
Keywords :
carrier lifetime; doping profiles; insulated gate bipolar transistors; leakage currents; power bipolar transistors; 1200 V; backside collector layer; backside doping optimization process; carrier lifetime; carrier stored trench-gate bipolar transistor; collector structure; high voltage power device; leakage current; light punch-through IGBT; reinforced N buffer; thin N drift; thin wafer IGBT; vertical shrink; Annealing; Bipolar transistors; Charge carrier lifetime; Doping profiles; Insulated gate bipolar transistors; Ion implantation; Leakage current; Performance loss; Temperature; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Power Semiconductor Devices and IC's, 2006. ISPSD 2006. IEEE International Symposium on
Conference_Location :
Naples
Print_ISBN :
0-7803-9714-2
Type :
conf
DOI :
10.1109/ISPSD.2006.1666089
Filename :
1666089
Link To Document :
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