DocumentCode :
2367927
Title :
PBTI mechanisms in La containing Hf-based oxides assessed by very Fast IV measurements
Author :
Garros, X. ; Brunet, L. ; Rafik, M. ; Coignus, J. ; Reimbold, G. ; Vincent, E. ; Bravaix, A. ; Boulanger, F.
Author_Institution :
CEA-Leti, Grenoble, France
fYear :
2010
fDate :
6-8 Dec. 2010
Abstract :
PBTI in La-doped HfSiON/TiN stacks is investigated using Ultra Fast IV measurements. Excellent PBTI lifetime of these oxides is demonstrated. We also show that PBTI is explained only by trapping in stress induced defects and not by trapping in pre-existing ones. Dependence on oxide field, temperature activation and recovery of PBTI are also investigated and modeled.
Keywords :
semiconductor device measurement; PBTI lifetime; ultra fast IV measurements;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting (IEDM), 2010 IEEE International
Conference_Location :
San Francisco, CA
ISSN :
0163-1918
Print_ISBN :
978-1-4424-7418-5
Electronic_ISBN :
0163-1918
Type :
conf
DOI :
10.1109/IEDM.2010.5703297
Filename :
5703297
Link To Document :
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