DocumentCode :
2368326
Title :
Band-engineered Ge-on-Si lasers
Author :
Liu, Jifeng ; Sun, Xiaochen ; Camacho-Aguilera, Rodolfo ; Cai, Yan ; Michel, Jurgen ; Kimerling, Lionel C.
Author_Institution :
Thayer Sch. of Eng., Dartmouth Coll., Hanover, NH, USA
fYear :
2010
fDate :
6-8 Dec. 2010
Abstract :
We report optically-pumped Ge-on-Si lasers with direct gap emission near 1600 nm at room temperature. The Ge-on-Si material was band-engineered by tensile strain and n-type doping to compensate the energy difference between direct and indirect band gaps for efficient light emission. Modeling of Ge/Si double heterojunction LEDs shows that it is possible to achieve >;10% quantum efficiency even assuming an Auger coefficient 10 times larger than reports in literature. Edge-emitting Ge-on-Si waveguide LEDs have also been demonstrated at room temperature. These simulation and experimental results strongly indicate the feasibility of electrically-pumped Ge-on-Si lasers.
Keywords :
Auger effect; Ge-Si alloys; elemental semiconductors; energy gap; integrated optics; light emitting diodes; optical pumping; optical waveguides; semiconductor doping; semiconductor heterojunctions; semiconductor lasers; Auger coefficient; Ge-Si; Si; band-engineered lasers; direct band gap emission; double heterojunction LED; edge-emitting waveguide LED; indirect band gap; n-type doping; optically-pumped lasers; quantum efficiency; temperature 293 K to 298 K; tensile strain;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting (IEDM), 2010 IEEE International
Conference_Location :
San Francisco, CA
ISSN :
0163-1918
Print_ISBN :
978-1-4424-7418-5
Electronic_ISBN :
0163-1918
Type :
conf
DOI :
10.1109/IEDM.2010.5703311
Filename :
5703311
Link To Document :
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