• DocumentCode
    2368502
  • Title

    A robust finite element vector formulation of the semiconductor drift-diffusion equations incorporating anisotropic transport properties

  • Author

    Johnson, C.M. ; Trattles, J.T.

  • Author_Institution
    Dept. of Electr. & Electron. Eng., Newcastle upon Tyne Univ., UK
  • fYear
    1996
  • fDate
    2-4 Sept. 1996
  • Firstpage
    133
  • Lastpage
    134
  • Abstract
    In this paper, a new finite element vector formulation of the drift-diffusion model, including anisotropic effects, is introduced. Stability criteria for the model are described and a methodology is presented for providing stable solutions for spatial discretisations that include both acute and obtuse triangles, including cases where there is a large stretching of the element.
  • Keywords
    carrier mobility; diffusion; finite element analysis; semiconductor device models; anisotropic transport properties; element stretching; robust finite element vector formulation; semiconductor drift-diffusion equations; spatial discretisations; stability criteria; Anisotropic magnetoresistance; Current density; Equations; Finite element methods; Impact ionization; Interpolation; Licenses; Robustness; Shape control; Tensile stress;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Simulation of Semiconductor Processes and Devices, 1996. SISPAD 96. 1996 International Conference on
  • Print_ISBN
    0-7803-2745-4
  • Type

    conf

  • DOI
    10.1109/SISPAD.1996.865310
  • Filename
    865310