DocumentCode
2368502
Title
A robust finite element vector formulation of the semiconductor drift-diffusion equations incorporating anisotropic transport properties
Author
Johnson, C.M. ; Trattles, J.T.
Author_Institution
Dept. of Electr. & Electron. Eng., Newcastle upon Tyne Univ., UK
fYear
1996
fDate
2-4 Sept. 1996
Firstpage
133
Lastpage
134
Abstract
In this paper, a new finite element vector formulation of the drift-diffusion model, including anisotropic effects, is introduced. Stability criteria for the model are described and a methodology is presented for providing stable solutions for spatial discretisations that include both acute and obtuse triangles, including cases where there is a large stretching of the element.
Keywords
carrier mobility; diffusion; finite element analysis; semiconductor device models; anisotropic transport properties; element stretching; robust finite element vector formulation; semiconductor drift-diffusion equations; spatial discretisations; stability criteria; Anisotropic magnetoresistance; Current density; Equations; Finite element methods; Impact ionization; Interpolation; Licenses; Robustness; Shape control; Tensile stress;
fLanguage
English
Publisher
ieee
Conference_Titel
Simulation of Semiconductor Processes and Devices, 1996. SISPAD 96. 1996 International Conference on
Print_ISBN
0-7803-2745-4
Type
conf
DOI
10.1109/SISPAD.1996.865310
Filename
865310
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