DocumentCode :
2368544
Title :
The application of TCAD in industry
Author :
Mar, Jerry
Author_Institution :
Intel Corp., Santa Clara, CA, USA
fYear :
1996
fDate :
2-4 Sept. 1996
Firstpage :
139
Lastpage :
145
Abstract :
The key to making use of TCAD in industry is matching available capabilities to specific applications to multiply information from available experimental wafers. The art of using such partial capabilities is the focus of this paper. The following sections will describe applications of TCAD in four areas: technology selection, process optimization, process control, and design optimization.
Keywords :
CAD; electronics industry; integrated circuit manufacture; semiconductor process modelling; IC industry; TCAD; design optimization; process control; process optimization; technology selection; Chemistry; Circuit simulation; Computational modeling; Costs; Design optimization; Impurities; Integrated circuit modeling; Physics; Predictive models; Semiconductor process modeling;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Simulation of Semiconductor Processes and Devices, 1996. SISPAD 96. 1996 International Conference on
Print_ISBN :
0-7803-2745-4
Type :
conf
DOI :
10.1109/SISPAD.1996.865313
Filename :
865313
Link To Document :
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