DocumentCode
2368544
Title
The application of TCAD in industry
Author
Mar, Jerry
Author_Institution
Intel Corp., Santa Clara, CA, USA
fYear
1996
fDate
2-4 Sept. 1996
Firstpage
139
Lastpage
145
Abstract
The key to making use of TCAD in industry is matching available capabilities to specific applications to multiply information from available experimental wafers. The art of using such partial capabilities is the focus of this paper. The following sections will describe applications of TCAD in four areas: technology selection, process optimization, process control, and design optimization.
Keywords
CAD; electronics industry; integrated circuit manufacture; semiconductor process modelling; IC industry; TCAD; design optimization; process control; process optimization; technology selection; Chemistry; Circuit simulation; Computational modeling; Costs; Design optimization; Impurities; Integrated circuit modeling; Physics; Predictive models; Semiconductor process modeling;
fLanguage
English
Publisher
ieee
Conference_Titel
Simulation of Semiconductor Processes and Devices, 1996. SISPAD 96. 1996 International Conference on
Print_ISBN
0-7803-2745-4
Type
conf
DOI
10.1109/SISPAD.1996.865313
Filename
865313
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