Title :
RF performance of short channel graphene field-effect transistor
Author :
Wu, Y.Q. ; Lin, Y.-M. ; Jenkins, K.A. ; Ott, J.A. ; Dimitrakopoulos, C. ; Farmer, D.B. ; Xia, F. ; Grill, A. ; Antoniadis, D.A. ; Avouris, Ph.
Author_Institution :
T.J. Watson Res. Center, IBM, Yorktown Heights, NY, USA
Abstract :
In this paper, the authors present experimental studies on transport characteristics of graphene FETs with channel lengths down to 70 nm. The factors limiting the performance of short channel graphene devices are discussed. RF performance of a sub-100 nm graphene transistor fabricated on epitaxial graphene grown on a SiC substrate is also presented. A cut-off frequency as high as 170 GHz is achieved in a 90 nm graphene FET using a scalable top-down fabrication processes. Our results indicate that further improvement of RF performance of graphene FETs can be enabled by channel length scaling with structure optimization and contact resistance reduction.
Keywords :
epitaxial growth; field effect transistors; graphene; silicon compounds; wide band gap semiconductors; SiC; channel length scaling; contact resistance reduction; epitaxial graphene; epitaxial growth; frequency 170 GHz; scalable top-down fabrication; short channel graphene field-effect transistor; size 70 nm; size 90 nm; structure optimization;
Conference_Titel :
Electron Devices Meeting (IEDM), 2010 IEEE International
Conference_Location :
San Francisco, CA
Print_ISBN :
978-1-4424-7418-5
Electronic_ISBN :
0163-1918
DOI :
10.1109/IEDM.2010.5703331