DocumentCode :
2368924
Title :
A simple method to fabricate silicon nanowires arrays by a catalytic electrochemical etching process
Author :
Li, Xiaocheng ; Kang Tay, Beng ; You, Guofeng ; Yang, Yi
Author_Institution :
Sch. of Electr. & Electron. Eng., Nanyang Technol. Univ., Singapore
fYear :
2008
fDate :
24-27 March 2008
Firstpage :
860
Lastpage :
862
Abstract :
We present a simple method to fabricate large area of silicon nanowires array with low-cost and throughput by a catalytic electrochemical etching process. In our experiment, a thin layer of polyelectrolyte (PAH) was used to absorb negatively charged PS sphere. Using the PS sphere as mask, the silicon nanowires arrays were fabricated by a silver catalytic electrochemical etching process. By SEM and Raman spectrum, the structure and properties of silicon nanowires arrays were also studied.
Keywords :
Raman spectra; catalysis; electrochemistry; elemental semiconductors; etching; nanotechnology; nanowires; scanning electron microscopy; semiconductor growth; silicon; Raman spectrum; SEM; Si; catalytic electrochemical etching; polyelectrolyte; silicon nanowires array; thin layer; Circuits; Crystallization; Etching; Nanowires; Sensor arrays; Silicon; Silver; Substrates; Surface treatment; Throughput;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Nanoelectronics Conference, 2008. INEC 2008. 2nd IEEE International
Conference_Location :
Shanghai
Print_ISBN :
978-1-4244-1572-4
Electronic_ISBN :
978-1-4244-1573-1
Type :
conf
DOI :
10.1109/INEC.2008.4585619
Filename :
4585619
Link To Document :
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