• DocumentCode
    2369507
  • Title

    Metal plugs produced by excimer laser melting for submicron interconnection: mechanism, electrical properties

  • Author

    Mukai, R. ; Iizuka, M. ; Kudo, H. ; Nakano, M.

  • Author_Institution
    Fujitsu Ltd., Adv. Technol. Div., Kawasaki, Japan
  • fYear
    1991
  • fDate
    11-12 Jun 1991
  • Firstpage
    192
  • Lastpage
    198
  • Abstract
    A new laser planarization technique for producing metal plugs has been developed. In this technique, a thin metal cap which is patterned to cover the entire via hole is used, followed by melting with a XeCl excimer laser irradiation. The molten metal cap is drawn into the via by surface tension forces resulting in the formation of the metal plug. The use of the metal cap means that the plug formation is performed easily and stably. And is an effective method for submicron interconnection. The interconnects were tested on a contact check device composed of 60000 vias connected in series. The characteristics agree well with the results calculated using the electrical resistivity of metal
  • Keywords
    VLSI; excimer lasers; laser beam applications; metallisation; xenon compounds; XeCl excimer laser; electrical properties; excimer laser melting; laser planarization technique; mechanism; metal plug formation; submicron interconnection; thin metal cap; via hole filling; Contacts; Insulation; Laser beams; Mechanical factors; Optical films; Optical pulses; Planarization; Plugs; Shape; Very large scale integration;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    VLSI Multilevel Interconnection Conference, 1991, Proceedings., Eighth International IEEE
  • Conference_Location
    Santa Clara, CA
  • Print_ISBN
    0-87942-673-X
  • Type

    conf

  • DOI
    10.1109/VMIC.1991.152985
  • Filename
    152985