DocumentCode :
2369914
Title :
Photodetector structures for standard CMOS imaging applications
Author :
Durini, Daniel ; Hosticka, Bedrich J.
Author_Institution :
Univ. Duisburg- Essen/Fraunhofer IMS Duisburg, Duisburg
fYear :
2007
fDate :
2-5 July 2007
Firstpage :
193
Lastpage :
196
Abstract :
In this investigation we show how a standard 0.5 mum twin-well CMOS process can be used for CMOS imaging. The process features a single-polysilicon layer, as well as three metal layers, and it is LOCOS based. We discuss various issues affecting photodetection tasks in CMOS imaging applications and present an extensive study of possible photodetector structures. Also, we propose a novel CMOS imaging pixel structure, which exceeds the standard CMOS 2-D imaging performance.
Keywords :
CMOS image sensors; oxidation; photodetectors; silicon; LOCOS; photodetector; single-polysilicon layer; size 0.5 mum; twin-well CMOS imaging; CMOS process; CMOS technology; Capacitance; Epitaxial layers; P-n junctions; Photodetectors; Reflectivity; Silicon; Surface waves; Thyristors;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Research in Microelectronics and Electronics Conference, 2007. PRIME 2007. Ph.D.
Conference_Location :
Bordeaux
Print_ISBN :
978-1-4244-1000-2
Electronic_ISBN :
978-1-4244-1001-9
Type :
conf
DOI :
10.1109/RME.2007.4401845
Filename :
4401845
Link To Document :
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