• DocumentCode
    2370016
  • Title

    The high-field drift velocity in degenerately-doped silicon nanowires

  • Author

    Lau, Hui Houg ; Hii, Hui ; Lee, Aaron Chii Enn ; Ahmadi, M. Taghi ; Ismail, Razali ; Arora, Vijay K.

  • Author_Institution
    Fac. of Electr. Eng., Univ. Teknol. Malaysia, Skudai
  • fYear
    2008
  • fDate
    24-27 March 2008
  • Firstpage
    1121
  • Lastpage
    1126
  • Abstract
    The nanowires and nanotubes are being considered as the best candidates for high-speed applications. The mobility and saturation velocity are the two important parameters that control the charge transport in any conducting channel. It is shown that the high mobility does not always lead to higher carrier velocity. The ultimate drift velocity due to the high-electric-field streaming are based on the asymmetrical distribution function that converts randomness in zero-field to streamlined one in a very high electric field. The limited drift velocity is found to be appropriate thermal velocity for a non degenerately doped sample of silicon, increasing with the temperature, but independent of carrier concentration. However, the limited drift velocity is the Fermi velocity for a degenerately doped silicon nanowire, increasing with carrier concentration but independent of temperature. The results obtained are applied to the modeling of a nanowire transistor.
  • Keywords
    carrier density; degenerate semiconductors; elemental semiconductors; nanowires; semiconductor quantum wires; silicon; Fermi velocity; Si; asymmetrical distribution function; carrier concentration; carrier velocity; charge transport; high-field drift velocity; nanotubes; nanowires; thermal velocity; Electron mobility; Nanoelectronics; Nanowires; Silicon;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Nanoelectronics Conference, 2008. INEC 2008. 2nd IEEE International
  • Conference_Location
    Shanghai
  • Print_ISBN
    978-1-4244-1572-4
  • Electronic_ISBN
    978-1-4244-1573-1
  • Type

    conf

  • DOI
    10.1109/INEC.2008.4585679
  • Filename
    4585679