DocumentCode :
2370955
Title :
Hysteretic drain-current behavior due to random telegraph noise in Scaled-down FETs with high-κ/metal-gate stacks
Author :
Miki, Hiroshi ; Tega, Naoki ; Ren, Zhibin ; D´Emic, Christopher P. ; Zhu, Yu ; Frank, David J. ; Guillorn, Michael A. ; Park, Dae-Gyu ; Haensch, Wilfried ; Torii, Kazuyoshi
Author_Institution :
Semicond. Innovation Res. Project, Hitachi America, Ltd., Yorktown Heights, NY, USA
fYear :
2010
fDate :
6-8 Dec. 2010
Abstract :
This work demonstrates for the first time that hysteretic effects associated with random telegraph noise (RTN) can lead to the short-term enhancement of drain current in the turn-on transient of scaled-down FETs. Comprehensive time domain analyses of this hysteretic behavior prove that it is a consequence of the voltage-dependence of the capture and emission rates of the RTN traps, which is measured deep into the subthreshold regime using a new technique. Relevant trap parameters are proposed and statistically accumulated. Understanding and characterizing this temporal behavior is essential to determining the impact of RTN on scaled SRAM operation.
Keywords :
SRAM chips; field effect transistors; high-k dielectric thin films; hysteresis; random noise; semiconductor device noise; time-domain analysis; transient analysis; RTN traps; SRAM; high-κ-metal-gate stacks; hysteretic drain-current behavior; hysteretic effects; random telegraph noise; scaled-down FET; time domain analyses; turn-on transient; voltage-dependence;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting (IEDM), 2010 IEEE International
Conference_Location :
San Francisco, CA
ISSN :
0163-1918
Print_ISBN :
978-1-4424-7418-5
Electronic_ISBN :
0163-1918
Type :
conf
DOI :
10.1109/IEDM.2010.5703435
Filename :
5703435
Link To Document :
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