DocumentCode :
2371000
Title :
NIST comparison of the quantized Hall resistance and the realization of the SI ohm through the calculable capacitor
Author :
Jeffrey, Alan ; Elmquist, R.E. ; Lee, L.H. ; Shields, J.Q. ; Dziuba, R.F.
Author_Institution :
Nat. Inst. of Stand. & Technol., Gaithersburg, MD, USA
fYear :
1996
fDate :
17-21 June 1996
Firstpage :
10
Lastpage :
11
Abstract :
The latest NIST results from the comparison of the quantized Hall resistance (QI-IR), with the realization of the SI ohm obtained from the calculable capacitor measurement are reported. Various systematic checks have been performed.
Keywords :
electric resistance measurement; quantum Hall effect; units (measurement); AC measurements; DC measurements; Hamon device; NIST comparison; SI ohm; calculable capacitor; calculable capacitor measurement; cryogenic current comparator; periodic comparisons; quantized Hall resistance; systematic checks; Bridges; Current measurement; Detectors; Electrical resistance measurement; Gain measurement; Leak detection; Measurement standards; NIST; Q measurement; Resistors;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Precision Electromagnetic Measurements Digest, 1996 Conference on
Conference_Location :
Braunschweig, Germany
Print_ISBN :
0-7803-3376-4
Type :
conf
DOI :
10.1109/CPEM.1996.546531
Filename :
546531
Link To Document :
بازگشت