• DocumentCode
    2371618
  • Title

    W-band Single-Anode MIG for Gyro-TWT

  • Author

    Yin, Rui-Jian ; Liu, Pu-Kun ; Lai, Guo-Jun

  • Author_Institution
    Inst. of Electron., Chinese Acad. of Sci.
  • fYear
    0
  • fDate
    0-0 0
  • Firstpage
    267
  • Lastpage
    268
  • Abstract
    A coherent microwave and millimeter wave generation from fast-wave gyro-devices are attractive due to their high power handing capability. They have many applications such as plasma generation and heating, high gradient particle accelerators, and material processing. In the fast-wave gyro-devices, since the beam-wave interaction takes place between a transverse electric field of a guided wave and an electron transverse momentum, producing a high quality gyrating electron beam with a low velocity spread is a critical issue in the design of high performance gyro-devices. Different types of electron guns producing the gyrating electron beam with a large transverse momentum have been studied in many countries. The double-anode and single-anode magnetron-injection-guns (MIG) are commonly used. Due to the mechanical complexity of the double-anode MIG , however, the single-anode MIG which does not include the modulating anode seems attractive for use in practical devices. This paper describes studying on a single-anode MIG which produce a high quality gyrating electron beam. The design is based on analytic trade-off equations. And computer simulation uses the electron trajectory code-EGUN. The electron gun is used for a W-band, TE 01 gyro-TWT amplifier which required to producing a small orbit electron beam
  • Keywords
    electron beams; electron guns; gyrotrons; magnetrons; travelling wave tubes; W-band; beam-wave interaction; electron guns; gyrating electron beam; gyro-TWT; high power handing; magnetron-injection-guns; transverse electric field; Electromagnetic heating; Electron beams; High power microwave generation; Linear particle accelerator; Microwave generation; Plasma accelerators; Plasma applications; Plasma materials processing; Plasma waves; Power generation;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Vacuum Electronics Conference, 2006 held Jointly with 2006 IEEE International Vacuum Electron Sources., IEEE International
  • Conference_Location
    Monterey, CA
  • Print_ISBN
    1-4244-0108-9
  • Type

    conf

  • DOI
    10.1109/IVELEC.2006.1666287
  • Filename
    1666287