DocumentCode :
2371787
Title :
A DC to AC radiation converter based on plasma ionization
Author :
Mori, W.B. ; Katsouleas, T. ; Lai, C.H. ; Muggli, P. ; Liou, R.L. ; Brogle, R. ; Dawson, J.M.
Author_Institution :
California Univ., Los Angeles, CA, USA
fYear :
1995
fDate :
5-8 June 1995
Firstpage :
242
Abstract :
Summary form only given, as follows. We describe programs on a new class of high power radiation source. Rather than create electromagnetic fields, the present scheme frequency upshifts an existing static field (/spl omega/=0, k=k/sub 0/) by temporally varying the dielectric properties of a medium (i.e., ionizing a gas). An array of alternating capacitors is charged to a large voltage to produce a static electric field of the form E/spl sim/(E/sub 0/ sin k/sub 0/ Z) y. When the region between the capacitors is filled with a low density working gas and ionized by a short-pulse laser, a phased discharge current generates a radiation pulse following behind the ionizing laser. The frequency of the radiation generated scales as f=8 GHz (n/sub 0//10/sup 12/ cm/sup -3/) (1 cm/k/sub o/), where n/sub 0/ is the plasma density. The output frequency, pulse duration, bandwidth, arbitrary chirp, etc. can be controlled by varying the gas pressure and/or capacitor spacing. Output power is determined by the bias voltage, and high powers are in principal possible by using pulsed biases. At USC/UCLA proof-of-principle experiments are underway to test the predicted characteristics of this alternative source of high-power microwaves. Preliminary results are presented.
Keywords :
DC-AC power convertors; ionisation; microwave generation; plasma density; plasma production by laser; 8 GHz; DC to AC radiation converter; alternating capacitor array; arbitrary chirp; bandwidth; bias voltage; capacitor spacing; dielectric properties; electromagnetic fields; gas pressure; high power radiation source; high-power microwaves; ionizing laser; low density working gas; output frequency; output power; phased discharge current; plasma ionization; pulse duration; pulsed biases; radiation pulse; short-pulse laser; static electric field; static field; Analog-digital conversion; Capacitors; Frequency; Gas lasers; Ionization; Ionizing radiation; Optical pulse generation; Plasma properties; Plasma sources; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Science, 1995. IEEE Conference Record - Abstracts., 1995 IEEE International Conference on
Conference_Location :
Madison, WI, USA
ISSN :
0730-9244
Print_ISBN :
0-7803-2669-5
Type :
conf
DOI :
10.1109/PLASMA.1995.533229
Filename :
533229
Link To Document :
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