Title :
High-Voltage Gun Micro-Arcs and Beam Energy Variations
Author :
Katsap, V. ; Kendall, R.A. ; Scales, V.A. ; Yahn, W.W.
Author_Institution :
NuFlare Technol.
Abstract :
In e-beam lithography tools, beam energy variation is limited to ppm levels, which is provided by sophisticated high-voltage power supplies. However, stochastic events such as micro-arcs may change beam energy beyond required limits. We report results of micro-arcs effects minimization in 50 kV triode gun
Keywords :
cable shielding; cables (electric); triodes; vacuum arcs; 50 kV; beam energy variations; e-beam lithography tools; high-voltage power supplies; micro-arcs effects; triode gun; Cable shielding; Capacitance; Cathodes; Guns; Lithography; Monitoring; Stochastic processes; Surface discharges; Voltage; Wire;
Conference_Titel :
Vacuum Electronics Conference, 2006 held Jointly with 2006 IEEE International Vacuum Electron Sources., IEEE International
Conference_Location :
Monterey, CA
Print_ISBN :
1-4244-0108-9
DOI :
10.1109/IVELEC.2006.1666322