• DocumentCode
    2373141
  • Title

    Monte Carlo simulation of initial stages of Si (111) Oxidation by O2 near critical conditions

  • Author

    Gladkikh, Nadezhda A. ; Shwartz, Nataliya L. ; Yanovitskaja, Zoya Sh

  • Author_Institution
    Novosibirsk State Tech. Univ., Novosibirsk
  • fYear
    2008
  • fDate
    1-5 July 2008
  • Firstpage
    8
  • Lastpage
    11
  • Abstract
    Monte-Carlo simulation of Si (111) surface interaction with dry oxygen near the critical conditions, separating Si etching and oxidation regions, was carried out. The reaction of formation and decomposition of silicon monoxide was included in the model. Just this reaction determines the rate of oxygen accumulation on Si (111) surface. Model critical conditions were determined from the Si etching to oxide growth transition. The scheme and parameters of chemical reactions were selected in such a way that the model critical conditions, would correspond to experimental data.
  • Keywords
    Monte Carlo methods; adsorption; dissociation; elemental semiconductors; etching; oxidation; reaction kinetics theory; silicon; Monte Carlo simulation; Si; Si (111) surface; adsorption; chemical reactions; decomposition; etching; oxidation; silicon monoxide; Atomic layer deposition; Chemicals; Dry etching; History; Monte Carlo methods; Nanoelectronics; Oxidation; Physics; Silicon; Surface cleaning; Monte Carlo; Si(111); oxidation; silicon monoxide; simulation;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices and Materials, 2008. EDM 2008. 9th International Workshop and Tutorials on
  • Conference_Location
    Novosibirsk
  • ISSN
    1815-3712
  • Print_ISBN
    978-5-7782-0893-3
  • Type

    conf

  • DOI
    10.1109/SIBEDM.2008.4585846
  • Filename
    4585846