DocumentCode :
2373141
Title :
Monte Carlo simulation of initial stages of Si (111) Oxidation by O2 near critical conditions
Author :
Gladkikh, Nadezhda A. ; Shwartz, Nataliya L. ; Yanovitskaja, Zoya Sh
Author_Institution :
Novosibirsk State Tech. Univ., Novosibirsk
fYear :
2008
fDate :
1-5 July 2008
Firstpage :
8
Lastpage :
11
Abstract :
Monte-Carlo simulation of Si (111) surface interaction with dry oxygen near the critical conditions, separating Si etching and oxidation regions, was carried out. The reaction of formation and decomposition of silicon monoxide was included in the model. Just this reaction determines the rate of oxygen accumulation on Si (111) surface. Model critical conditions were determined from the Si etching to oxide growth transition. The scheme and parameters of chemical reactions were selected in such a way that the model critical conditions, would correspond to experimental data.
Keywords :
Monte Carlo methods; adsorption; dissociation; elemental semiconductors; etching; oxidation; reaction kinetics theory; silicon; Monte Carlo simulation; Si; Si (111) surface; adsorption; chemical reactions; decomposition; etching; oxidation; silicon monoxide; Atomic layer deposition; Chemicals; Dry etching; History; Monte Carlo methods; Nanoelectronics; Oxidation; Physics; Silicon; Surface cleaning; Monte Carlo; Si(111); oxidation; silicon monoxide; simulation;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices and Materials, 2008. EDM 2008. 9th International Workshop and Tutorials on
Conference_Location :
Novosibirsk
ISSN :
1815-3712
Print_ISBN :
978-5-7782-0893-3
Type :
conf
DOI :
10.1109/SIBEDM.2008.4585846
Filename :
4585846
Link To Document :
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