High-Energy Electron/Solid State Interaction Modeling with MONSEL

Author

Katsap, V. ; Villarrubia, John

Author_Institution

NuFlare Technol.

fYear

0

fDate

0-0 0

Firstpage

435

Lastpage

436

Abstract

In e-beam tools, interactions between high-energy electrons and the solid target result in backscattering, absorption, and transmission. Each of these effects may be critical to tool performance, affecting resolution, image quality, and even high voltage breakdowns. In most cases, common sense and experience suggest using low-Z materials to minimize backscattering. A more quantitative approach uses MONSEL, a software package capable of modeling e-beam interaction with complex, multi-component, multi-layered 2D and 3D structures, We report on application of MONSEL to common problems found in e-beam lithography tools

Keywords

electron backscattering; electron beam lithography; electron emission; semiconductor process modelling; software packages; MONSEL; backscattering minimization; e-beam interaction modeling; e-beam lithography; e-beam tools; high voltage breakdowns; high-energy electron interaction; image quality; solid state interaction; Absorption; Application software; Backscatter; Dielectric breakdown; Electrons; Image quality; Image resolution; Software packages; Solid modeling; Solid state circuits;

fLanguage

English

Publisher

ieee

Conference_Titel

Vacuum Electronics Conference, 2006 held Jointly with 2006 IEEE International Vacuum Electron Sources., IEEE International

Conference_Location

Monterey, CA

Print_ISBN

1-4244-0108-9

Type

conf

DOI

10.1109/IVELEC.2006.1666369

Filename

1666369