• DocumentCode
    2373809
  • Title

    Review of ion energy and angular distributions in capacitively coupled RF plasma reactors

  • Author

    Kawamura, E. ; Vahedi, V. ; Lieberman, M.A. ; Birdsall, C.K.

  • Author_Institution
    Dept. of Electr. Eng. & Comput. Sci., California Univ., Berkeley, CA, USA
  • fYear
    1995
  • fDate
    5-8 June 1995
  • Firstpage
    248
  • Lastpage
    249
  • Abstract
    Summary form only given. We present a historical review and discussion of previous works on ion energy and angular distributions (IED and IAD) arriving at the target in the collisionless regime. This regime is of great interest to experimentalists and modelers studying the new generation of high density sources in which the sheath is much thinner than in the conventional RIE systems. The purpose of the review is to assess what has been done so far, and to clarify some issues about sheaths in high density systems. Having determined the important parameters, we will show some particle-in-cell simulation results of a dually excited capacitively coupled plasma in which the sheath ions roughly see the scaling as in high density sources. The results show that when /spl tau//sub ion///spl tau//sub RF/<1, the oscillating voltage and width of the RF sheath significantly affect the IEDs, where /spl tau//sub ion/ is the ion transit-time and /spl tau//sub RF/ is the RF period.
  • Keywords
    high-frequency discharges; plasma density; plasma devices; plasma production; plasma sheaths; plasma simulation; reviews; RF sheath; capacitively coupled RF plasma reactors; collisionless regime; dually excited capacitively coupled plasma; high density sources; high density system; historical review; ion angular distribution; ion energy distributions; particle-in-cell simulation; scaling; sheath; Contracts; Electrodes; Inductors; Plasma applications; Plasma density; Plasma devices; Plasma sheaths; Plasma simulation; Radio frequency; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Science, 1995. IEEE Conference Record - Abstracts., 1995 IEEE International Conference on
  • Conference_Location
    Madison, WI, USA
  • ISSN
    0730-9244
  • Print_ISBN
    0-7803-2669-5
  • Type

    conf

  • DOI
    10.1109/PLASMA.1995.533248
  • Filename
    533248