• DocumentCode
    2374150
  • Title

    Etching of quartz crystal spheres

  • Author

    Ward, Roger W.

  • Author_Institution
    Quartzdyne, Inc., Salt Lake City, UT, USA
  • fYear
    1993
  • fDate
    2-4 Jun 1993
  • Firstpage
    390
  • Lastpage
    396
  • Abstract
    Natural quartz crystal spheres were etched in various etchants at room temperature and at 80°C. Ten 12-mm-diameter polished natural quartz spheres were placed into each of several etchants, including 40% HF:60% NH4F, saturated NH4F-HF and lattice etch, at each of two nominal temperatures: 20°C and 80°C. The resulting quartz pieces were scanning electron micrographed normal to the resulting major plane and at right angles to the plane for the purpose of illustrating the anisotropy of the etch rate of quartz as a function of etchant and etchant temperature. The micrographs are presented and evaluated. All the etchants exhibit distinctly different figures at room temperature versus 80°C. This is consistent with earlier reports that crystal blanks etched at room temperature are generally "smoother" (i.e., different) than similar blanks etched in the same etchant at elevated temperatures
  • Keywords
    etching; piezoelectric materials; polishing; quartz; scanning electron microscopy; surface topography; 12 mm; 20 degC; 80 degC; SiO2; etch rate anisotropy; etchant temperature; lattice etch; polished natural quartz spheres; quartz crystal spheres etching; saturated NH4F-HF; scanning electron micrograph; Anisotropic magnetoresistance; Chemicals; Etching; Hafnium; Manufacturing; Shape; Surface finishing; Surface treatment; Temperature; Vibrations;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Frequency Control Symposium, 1993. 47th., Proceedings of the 1993 IEEE International
  • Conference_Location
    Salt Lake City, UT
  • Print_ISBN
    0-7803-0905-7
  • Type

    conf

  • DOI
    10.1109/FREQ.1993.367424
  • Filename
    367424