DocumentCode
2374150
Title
Etching of quartz crystal spheres
Author
Ward, Roger W.
Author_Institution
Quartzdyne, Inc., Salt Lake City, UT, USA
fYear
1993
fDate
2-4 Jun 1993
Firstpage
390
Lastpage
396
Abstract
Natural quartz crystal spheres were etched in various etchants at room temperature and at 80°C. Ten 12-mm-diameter polished natural quartz spheres were placed into each of several etchants, including 40% HF:60% NH4F, saturated NH4F-HF and lattice etch, at each of two nominal temperatures: 20°C and 80°C. The resulting quartz pieces were scanning electron micrographed normal to the resulting major plane and at right angles to the plane for the purpose of illustrating the anisotropy of the etch rate of quartz as a function of etchant and etchant temperature. The micrographs are presented and evaluated. All the etchants exhibit distinctly different figures at room temperature versus 80°C. This is consistent with earlier reports that crystal blanks etched at room temperature are generally "smoother" (i.e., different) than similar blanks etched in the same etchant at elevated temperatures
Keywords
etching; piezoelectric materials; polishing; quartz; scanning electron microscopy; surface topography; 12 mm; 20 degC; 80 degC; SiO2; etch rate anisotropy; etchant temperature; lattice etch; polished natural quartz spheres; quartz crystal spheres etching; saturated NH4F-HF; scanning electron micrograph; Anisotropic magnetoresistance; Chemicals; Etching; Hafnium; Manufacturing; Shape; Surface finishing; Surface treatment; Temperature; Vibrations;
fLanguage
English
Publisher
ieee
Conference_Titel
Frequency Control Symposium, 1993. 47th., Proceedings of the 1993 IEEE International
Conference_Location
Salt Lake City, UT
Print_ISBN
0-7803-0905-7
Type
conf
DOI
10.1109/FREQ.1993.367424
Filename
367424
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