• DocumentCode
    2374159
  • Title

    Bi- and three-dimensional prediction of etching shapes in quartz micromachined structures

  • Author

    Tellier, C.R. ; Leblois, T.G.

  • Author_Institution
    LCEP/ENSMM, Besancon, France
  • fYear
    1993
  • fDate
    2-4 Jun 1993
  • Firstpage
    397
  • Lastpage
    406
  • Abstract
    The anisotropic etching behavior of quartz crystal in ammonium bifluoride solution was studied and analyzed according to the tensorial model of dissolution. The dissolution slowness surface was determined from experiments. Two-dimensional and three-dimensional graphical simulations were performed, and the adequacy of the proposed slowness surface was considered. Numerical procedures have been developed to derive etching shapes encountered in conventional crystal etching (two-dimensional simulation) and in localized crystal dissolution (three-dimensional simulation for photolithography techniques). It is concluded the dissolution shapes derived from the proposed slowness surface do not depart very much from experimental shapes
  • Keywords
    atomic force microscopy; dissolving; etching; micromachining; numerical analysis; piezoelectric materials; quartz; surface topography; AFM; NH4F2; SiO2; anisotropic etching behavior; dissolution slowness surface; etching shapes; localized crystal dissolution; numerical method; photolithography techniques; quartz micromachined structures; surface topography; tensorial model; three-dimensional graphical simulations; two-dimensional simulation; Anisotropic magnetoresistance; Crystals; Equations; Etching; Fabrication; Kinematics; Mechanical sensors; Sensor phenomena and characterization; Shape; Tensile stress;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Frequency Control Symposium, 1993. 47th., Proceedings of the 1993 IEEE International
  • Conference_Location
    Salt Lake City, UT
  • Print_ISBN
    0-7803-0905-7
  • Type

    conf

  • DOI
    10.1109/FREQ.1993.367425
  • Filename
    367425