DocumentCode
2374159
Title
Bi- and three-dimensional prediction of etching shapes in quartz micromachined structures
Author
Tellier, C.R. ; Leblois, T.G.
Author_Institution
LCEP/ENSMM, Besancon, France
fYear
1993
fDate
2-4 Jun 1993
Firstpage
397
Lastpage
406
Abstract
The anisotropic etching behavior of quartz crystal in ammonium bifluoride solution was studied and analyzed according to the tensorial model of dissolution. The dissolution slowness surface was determined from experiments. Two-dimensional and three-dimensional graphical simulations were performed, and the adequacy of the proposed slowness surface was considered. Numerical procedures have been developed to derive etching shapes encountered in conventional crystal etching (two-dimensional simulation) and in localized crystal dissolution (three-dimensional simulation for photolithography techniques). It is concluded the dissolution shapes derived from the proposed slowness surface do not depart very much from experimental shapes
Keywords
atomic force microscopy; dissolving; etching; micromachining; numerical analysis; piezoelectric materials; quartz; surface topography; AFM; NH4F2; SiO2; anisotropic etching behavior; dissolution slowness surface; etching shapes; localized crystal dissolution; numerical method; photolithography techniques; quartz micromachined structures; surface topography; tensorial model; three-dimensional graphical simulations; two-dimensional simulation; Anisotropic magnetoresistance; Crystals; Equations; Etching; Fabrication; Kinematics; Mechanical sensors; Sensor phenomena and characterization; Shape; Tensile stress;
fLanguage
English
Publisher
ieee
Conference_Titel
Frequency Control Symposium, 1993. 47th., Proceedings of the 1993 IEEE International
Conference_Location
Salt Lake City, UT
Print_ISBN
0-7803-0905-7
Type
conf
DOI
10.1109/FREQ.1993.367425
Filename
367425
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