DocumentCode
2374645
Title
Application of quartz micromachining to the realization of a pressure sensor
Author
Danel, J.S. ; Dufour, M. ; Michel, F.
Author_Institution
LETI, Grenoble, France
fYear
1993
fDate
2-4 Jun 1993
Firstpage
587
Lastpage
596
Abstract
The possibility of using quartz for the realization of vibrating beams used as the basic part of a pressure sensor is examined. A comparison with silicon is made, as, from the point of view of their crystalline structure and their high modulus of elasticity, both materials are good candidates for such use. Quartz was preferred because of its simpler technology. A technology used for the micromachining of quartz and based on chemical etching is described. This knowledge was applied to the realization of a pressure sensor. The complete device, which consists of three sealed quartz wafers, is described. Original techniques for the realization of conductive tracks and for anodic bonding of quartz wafers are also described
Keywords
crystal resonators; etching; micromachining; pressure sensors; quartz; Si; SiO2; anodic bonding; chemical etching; conductive tracks; crystalline structure; pressure sensor; quartz micromachining; sealed quartz wafers; vibrating beams; Chemical technology; Crystalline materials; Crystallization; Elasticity; Etching; Micromachining; Micromechanical devices; Microstructure; Piezoelectric materials; Silicon;
fLanguage
English
Publisher
ieee
Conference_Titel
Frequency Control Symposium, 1993. 47th., Proceedings of the 1993 IEEE International
Conference_Location
Salt Lake City, UT
Print_ISBN
0-7803-0905-7
Type
conf
DOI
10.1109/FREQ.1993.367448
Filename
367448
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