DocumentCode :
237640
Title :
Performance assessment of virtual metrology in APC applications for the viability of sampling reductions
Author :
Keung Hui ; Mou, Jinyu
Author_Institution :
Taiwan Semicond. Manuf. Co., Ltd., Hsinchu, Taiwan
fYear :
2014
fDate :
18-22 Aug. 2014
Firstpage :
750
Lastpage :
755
Abstract :
This paper presents a detail investigation on the performances of adopting virtual metrology in applications of advanced process controls for the purpose of sampling reductions to cut down manufacturing costs. The intended application of virtual metrology is to replace hardware measurements instead of as digital gatekeeper or alarm-trigger of invoking advanced process controls. Whereas many feasibility instances have been reported, assessments of virtual metrology actually replacing hardware measurements for advanced process controls are few. This study investigates the performance boundaries that virtual metrology can be applied to advanced process controls without sacrificing process qualities. The limits govern whether virtual metrology can deliver what it is expected and help to map out directions of investment efforts prior to actual implementations.
Keywords :
computerised instrumentation; costing; investment; process control; production engineering computing; semiconductor industry; APC; advanced process controls; advanced semiconductor fabrication; digital gatekeeper; hardware measurements; investment efforts; manufacturing costs; performance assessment; performance boundaries; sampling reductions; sampling reductions viability; virtual metrology; Delays; Hardware; Manufacturing; Metrology; Noise; Process control; Steady-state;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Automation Science and Engineering (CASE), 2014 IEEE International Conference on
Conference_Location :
Taipei
Type :
conf
DOI :
10.1109/CoASE.2014.6899410
Filename :
6899410
Link To Document :
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