Transparent all organic TFT fabrication by low cost process without clean room

Author

Trigaud, T. ; Jazairi, I. El ; Kwon, S.Y. ; Bernical, V. ; Moliton, J.P.

Author_Institution

Fac. des Sci. et Tech., Limoges Univ.

fYear

2006

fDate

6-10 Nov. 2006

Firstpage

4876

Lastpage

4881

Abstract

Here is studied a process for the fabrication of a transparent all organic field effect transistor (OTFT) in a low cost way, without clean room. A major difficulty lies in the fact that substratum is CR39reg, an organic glass. Pentacene, PMMA, and ITO are implemented as respectively semiconductor, insulator, and materials for source, drain and gate electrodes. In preliminary results, ion beam sputtering (IBS) is used as technique for ITO deposition. Transistors characteristics are discussed. To improve the characteristics and increase the reproducibility, a DC magnetron process is proposed for the ITO deposition on CR39reg.Transparency and conductivity of the ITO layer obtained by this method are presented and discussed

Keywords

field effect transistors; ion beam applications; organic semiconductors; sputtering; thin film transistors; CR39reg; DC magnetron process; ITO layer conductivity; ITO layer transparency; PMMA; ion beam sputtering; organic field effect transistor; organic glass; pentacene; transparent all organic TFT fabrication; Conducting materials; Costs; Fabrication; Glass; Indium tin oxide; Insulation; OFETs; Organic thin film transistors; Pentacene; Thin film transistors;

fLanguage

English

Publisher

ieee

Conference_Titel

IEEE Industrial Electronics, IECON 2006 - 32nd Annual Conference on

Conference_Location

Paris

ISSN

1553-572X

Print_ISBN

1-4244-0390-1

Type

conf

DOI

10.1109/IECON.2006.347965

Filename

4153752