DocumentCode :
2379135
Title :
Tensile Strained Ge Layers Obtained via a Si-CMOS Compatible Approach
Author :
Capellini, Giovanni ; Kozlowski, Grzegorz ; Yamamoto, Yuji ; Lisker, Marco ; Schroeder, Thomas ; Ghrib, Abdelahmid ; De Kersauson, Malo ; El Kurdi, Moustafa ; Boucaud, Philippe ; Tillack, Bernd
fYear :
2012
fDate :
4-6 June 2012
Firstpage :
1
Lastpage :
2
Abstract :
Although rapid advances in Si photonics over the last decade has enabled mass production of higher functionality and lower cost photonic components (such as waveguides, couplers, modulators, photodetectors, etc..) integrated with both digital and analog circuitry in silicon complementary metal oxide semiconductor technology (Si-CMOS), an efficient electrically-pumped light emitter integrated in the Si-CMOS has so far been considered the Holy Grail of the monolithic electronics-photonics integration.
Keywords :
CMOS analogue integrated circuits; CMOS digital integrated circuits; elemental semiconductors; integrated optics; monolithic integrated circuits; silicon; CMOS compatible approach; Ge; Holy Grail; Si; analog integrated circuit; complementary metal oxide semiconductor technology; coupler; digital integrated circuit; electrically-pumped light emitter integration; modulator; monolithic electronic-photonic integration; photodetector; photonic component; tensile strained layer; waveguide; Fabrication; Germanium; Photonics; Silicon; Tensile strain;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Silicon-Germanium Technology and Device Meeting (ISTDM), 2012 International
Conference_Location :
Berkeley, CA
Print_ISBN :
978-1-4577-1864-9
Electronic_ISBN :
978-1-4577-1863-2
Type :
conf
DOI :
10.1109/ISTDM.2012.6222428
Filename :
6222428
Link To Document :
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