DocumentCode :
2379991
Title :
Ge/SiGe Multiple Quantum Well Optoelectronic Devices for Silicon Photonics
Author :
Chaisakul, Papichaya ; Marris-Morini, D. ; Rouifed, Mohamed-Saïd ; Isella, Giovanni ; Chrastina, Daniel ; Frigerio, Jacopo ; Le Roux, Xavier ; Edmond, Samson ; Coudevylle, Jean-René ; Vivien, Laurent
Author_Institution :
Inst. d´´Electron. Fondamentale, Univ. Paris-Sud, Orsay, France
fYear :
2012
fDate :
4-6 June 2012
Firstpage :
1
Lastpage :
2
Abstract :
Despite being an indirect-gap semiconductor, Ge quantum wells (QWs) have demonstrated, based on its direct gap transition, a QCSE as strong as that of direct-gap III-V semiconductor QWs. In this context, this paper presents our latest experimental results on the light modulation, detection, and emission behaviors of Ge/SiGe MQWs within the telecommunication wavelength region. From the experiments, DC and RF characteristics of Ge/SiGe MQW waveguide p-i-n diode embedded in a coplanar electrode will be reported. The behaviors of room temperature (RT) electroluminescence (EL) of its direct-gap transition are studied at different current injections and around Si chip temperatures of 20°C to 70°C.
Keywords :
Ge-Si alloys; electro-optical modulation; electroabsorption; electrodes; electroluminescence; elemental semiconductors; germanium; integrated optics; optical waveguides; p-i-n diodes; quantum well devices; semiconductor quantum wells; DC characteristics; Ge-SiGe; MQW waveguide p-i-n diode; QCSE; RF characteristics; Si; chip temperatures; coplanar electrode; current injections; direct gap transition; emission behaviors; indirect-gap semiconductor; light detection; light modulation; multiple quantum well optoelectronic devices; room temperature electroluminescence; silicon photonics; telecommunication wavelength; temperature 20 degC to 70 degC; temperature 293 K to 298 K; Modulation; Optical interconnections; Optical waveguides; Plasma temperature; Quantum well devices; Silicon; Silicon germanium;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Silicon-Germanium Technology and Device Meeting (ISTDM), 2012 International
Conference_Location :
Berkeley, CA
Print_ISBN :
978-1-4577-1864-9
Electronic_ISBN :
978-1-4577-1863-2
Type :
conf
DOI :
10.1109/ISTDM.2012.6222475
Filename :
6222475
Link To Document :
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