Title :
Hollow Cathode Electron Beam Formation and Effects on X-Ray Emission in Capillary Discharges
Author :
Valdivia, Maria Pia ; Wyndham, Edmund S. ; Favre, Mario
Author_Institution :
Fac. de Fis., Pontificia Univ. Catolica de Chile, Santiago, Chile
Abstract :
Electron beams produced by the hollow cathode effect are studied in a compact gas filled 24-kV, 5-kA capillary discharge. The characteristics and role of electron beams on X-ray production are studied in order to better understand their impact on X-ray production. X-ray plasma emission is analyzed with a spectrometer, while wideband diodes and Faraday cup probe both electron beams and X-rays. Electron beams of >5 keV are observed early on the discharge and two types of electron beams are identified: a first beam of high energy and low current (with a speed of ~5 × 107 m/s and a current density of ~4 × 10-2 A/cm2) enhanced by larger cathode apertures, and a second beam of low energy and high current enhanced by smaller cathode apertures. The use of a simple configuration of external magnets prevents X-ray fluorescence production, caused by electron beams, from reaching electronic detectors hence confusion when evaluating X-ray yield from the plasma source is avoided. This is particularly important in extreme ultraviolet lithography and soft X-ray production applications. Furthermore, the presence of the external magnets does not modify line emission, which is detected by means of spectrometry. Therefore, the use of external magnets provides a way to discriminate X-ray diode signals produced by source emitted X-rays and X-ray fluorescence from electron beams.
Keywords :
X-ray fluorescence analysis; cathodes; current density; discharges (electric); electron beams; electron emission; plasma X-ray sources; plasma magnetohydrodynamics; plasma probes; plasma sources; Faraday cup probe; X-ray fluorescence production; X-ray plasma emission analysis; capillary discharges; current 5 kA; current density; electronic detectors; external magnet configuration; extreme ultraviolet lithography applications; gas filled capillary discharge; hollow cathode electron beam formation; plasma source; soft X-ray production applications; spectrometry; voltage 24 kV; wideband diodes; Apertures; Cathodes; Discharges (electric); Electron beams; Fault location; Plasmas; Electron emission; X-rays; X-rays.; gas discharge devices; plasma devices; plasma diagnostics; plasma properties;
Journal_Title :
Plasma Science, IEEE Transactions on
DOI :
10.1109/TPS.2015.2450016