• DocumentCode
    2380399
  • Title

    Challenges in detecting and analyzing process-induced damage for 130nm CMOS technology and beyond [Title only-no paper published pgs 31-36]

  • Author

    Aum, P.

  • fYear
    2002
  • fDate
    2002
  • Firstpage
    31
  • Lastpage
    36
  • Keywords
    CMOS process; CMOS technology;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma- and Process-Induced Damage, 2002 7th International Symposium on
  • Print_ISBN
    0-9651577-7-6
  • Type

    conf

  • DOI
    10.1109/PPID.2002.1042602
  • Filename
    1042602
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=2380399