Title :
Process and doping species dependence of negative-bias-temperature instability for P-channel MOSFETs
Author :
Lee, Da-Yuan ; Horng-Chih Lin ; Chiang, Wan-Ju ; Wen-Tai La ; Nuang, G. ; Huang, Guo-Wei ; Wang, Tahui
Author_Institution :
National Chiuo Tung University
Keywords :
Boron; Degradation; Doping; Hydrogen; MOSFETs; Niobium compounds; Plasma devices; Plasma measurements; Titanium compounds; Tunneling;
Conference_Titel :
Plasma- and Process-Induced Damage, 2002 7th International Symposium on
Conference_Location :
Maui, HI, USA
Print_ISBN :
0-9651577-7-6
DOI :
10.1109/PPID.2002.1042631
