• DocumentCode
    2383391
  • Title

    NeoSilicon based nanoelectromechanical information devices

  • Author

    Oda, Shunri

  • Author_Institution
    Quantum Nanoelectron. Res. Center, Tokyo Inst. of Technol., Tokyo, Japan
  • fYear
    2012
  • fDate
    13-16 May 2012
  • Firstpage
    45
  • Lastpage
    48
  • Abstract
    NeoSilicon is a novel functional material consisted of ensemble of nanocrystalline Si quantum dots with controlled dot size and inter-dot distance. Bandgap of NeoSilicon can be controlled by dot size due to the quantum size effect and transport properties are controlled by inter-dot distance due to the tunneling effect. A variety of new applications, such as ballistic electron surface emitting display, high-efficiency light-emitting devices and photovoltaic devices is expected. MOS and NEM hybrid devices are promising for logic, memory and sensing applications, since new functions with ultralow power consumption are expected. Further scaling of NEM devices may provide novel functions based on unique phonon dispersion characteristics in nm-scale. Precise control of charge states in the multiple-coupled quantum dots is essential for spin based quantum information processing. In this talk, I will introduce fabrication of highly integrated nanocrystalline Si dots with uniform size, non-volatile NEM memory devices with a bistable floating gate, NEM-SET hybrid transistors, and unique transport processes in multiple-coupled quantum dot systems.
  • Keywords
    MIS devices; MOS memory circuits; energy gap; nanoelectromechanical devices; random-access storage; semiconductor quantum dots; MOS hybrid devices; NEM-SET hybrid transistors; NeoSilicon; band gap; bistable floating gate; nanocrystalline; nanoelectromechanical information devices; nonvolatile NEM memory devices; quantum dots; Logic gates; Nanoscale devices; Nonvolatile memory; Plasmas; Quantum dots; Silicon; Tunneling;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microelectronics (MIEL), 2012 28th International Conference on
  • Conference_Location
    Nis
  • ISSN
    pending
  • Print_ISBN
    978-1-4673-0237-1
  • Type

    conf

  • DOI
    10.1109/MIEL.2012.6222794
  • Filename
    6222794