• DocumentCode
    2383994
  • Title

    Principal component based k-nearest-neighbor rule for semiconductor process fault detection

  • Author

    He, Q. Peter ; Wang, Jin

  • Author_Institution
    Dept. of Chem. Eng., Tuskegee Univ., Tuskegee, AL
  • fYear
    2008
  • fDate
    11-13 June 2008
  • Firstpage
    1606
  • Lastpage
    1611
  • Abstract
    Fault detection and classification (FDC) has been recognized in the semiconductor industry as an integral component of advanced process control (APC) framework in improving overall equipment efficiency (OEE). To explicitly account for the unique characteristics of the semiconductor processes, such as nonlinearity in most batch processes, multimodal batch trajectories due to product mix, the fault detection method based on the k-nearest-neighbor rule (FD-kNN) has been developed previously for fault detection in semiconductor manufacturing. However, because FD-kNN does not generate a classifier offline, it is computational and storage intensive, which could make it difficult for online process monitoring. To take the advantages of principal component analysis (PCA) in dimensionality reduction and FD-kNN in nonlinearity and multimode handling, a principal component based kNN (PC- kNN) is proposed. Two simulated examples and an industrial example are used to demonstrate the performance of the proposed PC-kNN method in fault detection.
  • Keywords
    batch processing (industrial); data reduction; electron device manufacture; fault diagnosis; pattern classification; principal component analysis; process control; advanced process control framework; batch processes; dimensionality reduction; fault classification; k-nearest-neighbor rule; multimodal batch trajectories; multimode handling; overall equipment efficiency; principal component analysis; principal component based kNN; semiconductor industry; semiconductor manufacturing; semiconductor process fault detection; Chemical engineering; Covariance matrix; Electronics industry; Fault detection; Manufacturing processes; Matrix decomposition; Monitoring; Principal component analysis; Process control; Semiconductor process modeling;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    American Control Conference, 2008
  • Conference_Location
    Seattle, WA
  • ISSN
    0743-1619
  • Print_ISBN
    978-1-4244-2078-0
  • Electronic_ISBN
    0743-1619
  • Type

    conf

  • DOI
    10.1109/ACC.2008.4586721
  • Filename
    4586721