DocumentCode
2385507
Title
InP HBTs-present status and future trends
Author
Brar, B. ; Li, J.C. ; Pierson, R.L. ; Higgins, J.A.
Author_Institution
Rockwell Sci. Co., Thousand Oaks, CA, USA
fYear
2002
fDate
2002
Firstpage
155
Lastpage
161
Abstract
The fundamental materials advantages of III-V compound semiconductors are described. InP-based HBTs are shown to be a promising technology for high performance applications where the speed-breakdown product must substantially exceed that available from Si/SiGe. The primary challenges for InP are scaling down the device size, while simultaneously scaling up the number of transistors per chip. The results of such scaling efforts are expected to enable ICs requiring tens of thousands of transistors with clock frequencies approaching 250 GHz with useful breakdown voltages.
Keywords
III-V semiconductors; heterojunction bipolar transistors; indium compounds; InP; InP HBTs; breakdown voltages; clock frequencies; device size scaling down; speed-breakdown product; Breakdown voltage; Germanium silicon alloys; Heterojunction bipolar transistors; III-V semiconductor materials; Indium compounds; Indium gallium arsenide; Indium phosphide; Photonic band gap; Silicon germanium; Thermal conductivity;
fLanguage
English
Publisher
ieee
Conference_Titel
Bipolar/BiCMOS Circuits and Technology Meeting, 2002. Proceedings of the 2002
ISSN
1088-9299
Print_ISBN
0-7803-7561-0
Type
conf
DOI
10.1109/BIPOL.2002.1042908
Filename
1042908
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