• DocumentCode
    2385507
  • Title

    InP HBTs-present status and future trends

  • Author

    Brar, B. ; Li, J.C. ; Pierson, R.L. ; Higgins, J.A.

  • Author_Institution
    Rockwell Sci. Co., Thousand Oaks, CA, USA
  • fYear
    2002
  • fDate
    2002
  • Firstpage
    155
  • Lastpage
    161
  • Abstract
    The fundamental materials advantages of III-V compound semiconductors are described. InP-based HBTs are shown to be a promising technology for high performance applications where the speed-breakdown product must substantially exceed that available from Si/SiGe. The primary challenges for InP are scaling down the device size, while simultaneously scaling up the number of transistors per chip. The results of such scaling efforts are expected to enable ICs requiring tens of thousands of transistors with clock frequencies approaching 250 GHz with useful breakdown voltages.
  • Keywords
    III-V semiconductors; heterojunction bipolar transistors; indium compounds; InP; InP HBTs; breakdown voltages; clock frequencies; device size scaling down; speed-breakdown product; Breakdown voltage; Germanium silicon alloys; Heterojunction bipolar transistors; III-V semiconductor materials; Indium compounds; Indium gallium arsenide; Indium phosphide; Photonic band gap; Silicon germanium; Thermal conductivity;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Bipolar/BiCMOS Circuits and Technology Meeting, 2002. Proceedings of the 2002
  • ISSN
    1088-9299
  • Print_ISBN
    0-7803-7561-0
  • Type

    conf

  • DOI
    10.1109/BIPOL.2002.1042908
  • Filename
    1042908