DocumentCode
2386189
Title
Sub 0.2 μm lithography on 300 mm wafer
Author
Ganz, Dietmar ; Charles, Alain ; Hornig, Steffen R. ; Hraschan, Günther ; Koestler, Wolfram ; Maltabes, John ; Schedel, Thorsten ; Schmidt, Sebastian ; Mautz, Karl ; Schuster, Ralf
Author_Institution
SENECONDUCTOR300, Dresden, Germany
fYear
2000
fDate
2000
Firstpage
56
Lastpage
59
Abstract
We study the performance of the current 300mm lithography tool set for sub 0.2 μm processes. The results are discussed in terms of process capability and stability. It was determined that the non-linear errors which are much higher on 300 mm wafers than on 200 mm wafers had an influence, and this is discussed in detail. We determine the root causes for the stronger appearance of these effects and propose solutions to improve the overlay performance
Keywords
ultraviolet lithography; 0.2 micron; 300 mm; lithography; nonlinear errors; process capability; process stability; Current measurement; Displacement measurement; Focusing; Lenses; Lighting; Lithography; Production; Resists; Silicon; Testing;
fLanguage
English
Publisher
ieee
Conference_Titel
Semiconductor Manufacturing, 2000. Proceedings of ISSM 2000. The Ninth International Symposium on
Conference_Location
Tokyo
ISSN
1523-553X
Print_ISBN
0-7803-7392-8
Type
conf
DOI
10.1109/ISSM.2000.993616
Filename
993616
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