• DocumentCode
    2386207
  • Title

    Simultaneous cycle-time reduction and output enhancement in a fully loaded foundry wafer fab

  • Author

    Ho, C.M. ; Chen, T.C. ; Hseih, P. ; Chu, C. ; Houn, E. ; Su, K.J. ; Wang, P.M. ; Yew, W.C. ; Sun, S.W.

  • Author_Institution
    United Microelectron. Corp., Hsin-Chu, Taiwan
  • fYear
    2000
  • fDate
    2000
  • Firstpage
    63
  • Lastpage
    66
  • Abstract
    A case study is reported in how cycle-time reduction and output enhancement were accomplished simultaneously in a fully loaded foundry wafer fab. Within one-year period of time, a 50 K per month capacity 6" foundry fab improved its overall cycle-time by 35% with a concurrent fab wafer-output increase of over 20%. In the mean time, the fab WIP level was reduced by more than 20% without any compromise in line-yield or customer delivery.
  • Keywords
    integrated circuit manufacture; production control; 6 inch; case study; customer delivery; cycle-time reduction; fab WIP level; fully loaded foundry wafer fab; line-yield; output enhancement; production control; Capacity planning; EPROM; Foundries; Lithography; Microelectronics; Monitoring; Production control; Sun; Technological innovation; Throughput;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Semiconductor Manufacturing, 2000. Proceedings of ISSM 2000. The Ninth International Symposium on
  • ISSN
    1523-553X
  • Print_ISBN
    0-7803-7392-8
  • Type

    conf

  • DOI
    10.1109/ISSM.2000.993617
  • Filename
    993617