Title :
Breaking FAB constraint with implementing feedback process control
Author :
Takagaki, Kazuyuki ; Matsumoto, Norio ; Idera, Hirotaka ; Ishijima, Tetsushi ; Ueda, Yasuo
Author_Institution :
Process Eng. Group, Texas Instruments Japan Ltd., Ibaraki, Japan
Abstract :
We present a feed back process control model on a PC based process control support tool which was applied to the bottleneck of overlay and expose process in optical lithography process. It was successful in breaking the bottleneck
Keywords :
feedback; integrated circuit manufacture; photolithography; process control; production control; PC based process control support tool; feedback process control; optical lithography; process bottleneck; Information technology; Lithography; Manufacturing processes; Metrology; Optical feedback; Process control; Productivity; Read only memory; Resists; Testing;
Conference_Titel :
Semiconductor Manufacturing, 2000. Proceedings of ISSM 2000. The Ninth International Symposium on
Conference_Location :
Tokyo
Print_ISBN :
0-7803-7392-8
DOI :
10.1109/ISSM.2000.993620
