DocumentCode
2386259
Title
Breaking FAB constraint with implementing feedback process control
Author
Takagaki, Kazuyuki ; Matsumoto, Norio ; Idera, Hirotaka ; Ishijima, Tetsushi ; Ueda, Yasuo
Author_Institution
Process Eng. Group, Texas Instruments Japan Ltd., Ibaraki, Japan
fYear
2000
fDate
2000
Firstpage
75
Lastpage
78
Abstract
We present a feed back process control model on a PC based process control support tool which was applied to the bottleneck of overlay and expose process in optical lithography process. It was successful in breaking the bottleneck
Keywords
feedback; integrated circuit manufacture; photolithography; process control; production control; PC based process control support tool; feedback process control; optical lithography; process bottleneck; Information technology; Lithography; Manufacturing processes; Metrology; Optical feedback; Process control; Productivity; Read only memory; Resists; Testing;
fLanguage
English
Publisher
ieee
Conference_Titel
Semiconductor Manufacturing, 2000. Proceedings of ISSM 2000. The Ninth International Symposium on
Conference_Location
Tokyo
ISSN
1523-553X
Print_ISBN
0-7803-7392-8
Type
conf
DOI
10.1109/ISSM.2000.993620
Filename
993620
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