• DocumentCode
    2386350
  • Title

    Real time in-situ data acquisition using autonomous on-wafer sensor arrays

  • Author

    Freed, Mason ; Krüger, Michiel ; Poolla, Kameshwar ; Spanos, Costas

  • Author_Institution
    BCAM-Group, California Univ., Berkeley, CA, USA
  • fYear
    2000
  • fDate
    2000
  • Firstpage
    94
  • Lastpage
    97
  • Abstract
    We explore the feasibility of integrating in-situ sensors onto the surface of a silicon wafer, with the objective of placing this wafer into a processing tool to obtain real time measurements. This technique has numerous benefits: increased measurement speed, reduced sensor introduction cost, and increased spatial and temporal information Various sensors and sensor wafers have been developed and tested in a variety of processing tools. Repeatable, real time measurements in harsh environments such as high temperature and plasma have been obtained
  • Keywords
    data acquisition; elemental semiconductors; process monitoring; silicon; sputter etching; temperature sensors; thickness measurement; Si; autonomous on-wafer sensor arrays; harsh environments; high temperature; in-situ sensors; measurement speed; plasma environment; processing tool; real time in-situ data acquisition; real time measurements; silicon wafer; Conductivity; Data acquisition; Electrical resistance measurement; Etching; Plasma measurements; Plasma temperature; Pollution measurement; Sensor arrays; Temperature sensors; Testing;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Semiconductor Manufacturing, 2000. Proceedings of ISSM 2000. The Ninth International Symposium on
  • Conference_Location
    Tokyo
  • ISSN
    1523-553X
  • Print_ISBN
    0-7803-7392-8
  • Type

    conf

  • DOI
    10.1109/ISSM.2000.993624
  • Filename
    993624