• DocumentCode
    2386599
  • Title

    The most effective method for reducing PFC emissions caused by PECVD cleaning using the chamber impedance monitor

  • Author

    Yoda, Tetsuya ; Shimizu, Masao

  • Author_Institution
    Semicond. Operations, IBM Japan Ltd., Shiga, Japan
  • fYear
    2000
  • fDate
    2000
  • Firstpage
    143
  • Lastpage
    146
  • Abstract
    Reducing PFC emissions from PECVD (plasma enhanced chemical vapor deposition) cleaning is the key to meet the strict targets set by the WSC (World Semiconductor Council) in 1999. The effective method using the chamber impedance monitor is proposed for reducing PFC emissions for existing production lines
  • Keywords
    carbon compounds; electric impedance; environmental factors; process monitoring; surface cleaning; C2F6; CF4; PECVD cleaning; PFC emission reduction; WSC; chamber impedance monitor; perfluorinated compound; plasma enhanced chemical vapor deposition cleaning; production lines; Cleaning; Etching; Fluid flow; Global warming; Impedance; Monitoring; Potentiometers; Production; RF signals; Radio frequency;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Semiconductor Manufacturing, 2000. Proceedings of ISSM 2000. The Ninth International Symposium on
  • Conference_Location
    Tokyo
  • ISSN
    1523-553X
  • Print_ISBN
    0-7803-7392-8
  • Type

    conf

  • DOI
    10.1109/ISSM.2000.993635
  • Filename
    993635
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=2386599