DocumentCode :
2386599
Title :
The most effective method for reducing PFC emissions caused by PECVD cleaning using the chamber impedance monitor
Author :
Yoda, Tetsuya ; Shimizu, Masao
Author_Institution :
Semicond. Operations, IBM Japan Ltd., Shiga, Japan
fYear :
2000
fDate :
2000
Firstpage :
143
Lastpage :
146
Abstract :
Reducing PFC emissions from PECVD (plasma enhanced chemical vapor deposition) cleaning is the key to meet the strict targets set by the WSC (World Semiconductor Council) in 1999. The effective method using the chamber impedance monitor is proposed for reducing PFC emissions for existing production lines
Keywords :
carbon compounds; electric impedance; environmental factors; process monitoring; surface cleaning; C2F6; CF4; PECVD cleaning; PFC emission reduction; WSC; chamber impedance monitor; perfluorinated compound; plasma enhanced chemical vapor deposition cleaning; production lines; Cleaning; Etching; Fluid flow; Global warming; Impedance; Monitoring; Potentiometers; Production; RF signals; Radio frequency;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Semiconductor Manufacturing, 2000. Proceedings of ISSM 2000. The Ninth International Symposium on
Conference_Location :
Tokyo
ISSN :
1523-553X
Print_ISBN :
0-7803-7392-8
Type :
conf
DOI :
10.1109/ISSM.2000.993635
Filename :
993635
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=2386599
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