Title :
Polymer self assembly in semiconductor microelectronics
Author :
Black, C.T. ; Guarini, K.W. ; Ruiz, R. ; Sikorski, E.M. ; Babich, I.V. ; Sandstrom, R.L. ; Zhang, Y.
Author_Institution :
IBM T. J. Watson Res. Center, Yorktown Heights, NY
Abstract :
Integration of polymer self assembly with semiconductor processing enables sub-lithographic patterning of integrated circuit (IC) device elements and offers a non-traditional pathway to performance improvements (Black, 2005). We discuss target applications including surface-roughening for on-chip decoupling capacitors (Black et al., 2004), patterning nanocrystal floating gates for FLASH devices (Guarini et al., 2003), and defining FET channel arrays (Black, 2005)
Keywords :
integrated circuits; lithography; microassembling; FET channel arrays; FLASH devices; integrated circuit device elements; on-chip decoupling capacitors; patterning nanocrystal floating gates; polymer self assembly; semiconductor microelectronics; sub-lithographic patterning; surface-roughening; Capacitors; FETs; Microelectronics; Nanocrystals; Pattern formation; Polymers; Rough surfaces; Self-assembly; Semiconductor materials; Surface roughness;
Conference_Titel :
Electron Devices Meeting, 2006. IEDM '06. International
Conference_Location :
San Francisco, CA
Print_ISBN :
1-4244-0438-X
Electronic_ISBN :
1-4244-0439-8
DOI :
10.1109/IEDM.2006.346806
