DocumentCode
2386853
Title
Short cycle killer-particle control based on accurate in-line defect classification
Author
Shimoda, Atsushi ; Watanabe, Kenji ; Takagi, Yuji ; Maeda, Shunji
Author_Institution
Image Recognition & Inspection Syst. Dept, Hitachi Ltd., Yokohama, Japan
fYear
2000
fDate
2000
Firstpage
199
Lastpage
202
Abstract
We present a systematic yield ramp-up method that can quickly screen "killer" particles associated with yield loss and pinpoint their entry point to the process. The proposed method uses automatic defect classification (ADC) to segregate killer particles. The practicality of this method is demonstrated by the results of experiments using actual production wafers. This method will make killer particle control more timely.
Keywords
integrated circuit manufacture; integrated circuit yield; large scale integration; process control; LSI feature size; accurate in-line defect classification; automatic defect classification; killer particles segregation; production wafers; short cycle killer-particle control; systematic yield ramp-up method; yield loss; Equations; Etching; Image resolution; Inspection; Particle production; Pattern analysis; Performance evaluation; Production systems;
fLanguage
English
Publisher
ieee
Conference_Titel
Semiconductor Manufacturing, 2000. Proceedings of ISSM 2000. The Ninth International Symposium on
ISSN
1523-553X
Print_ISBN
0-7803-7392-8
Type
conf
DOI
10.1109/ISSM.2000.993648
Filename
993648
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