DocumentCode :
2387202
Title :
High efficiency airborne molecular contaminants removal technology by a new cooled-type 2-stage high-speed air washer method
Author :
Wakamatsu, Hidetoshi ; Matsuki, Mikio ; Tanaka, Norio ; Ogata, Hiroshi ; Iba, Hiroo ; Murata, Koichi
Author_Institution :
Oki Electr. Ind. Co. Ltd., Tokyo, Japan
fYear :
2000
fDate :
2000
Firstpage :
289
Lastpage :
292
Abstract :
We have developed a new cooled-type 2-stage high-speed air washer treating technique to remove the high-concentration airborne molecular contaminants (AMC) in the outside air. This technique was applied in an air-conditioning system to treat the intake air of the clean room. The new air conditioning system can treat the AMC to a sufficiently lower concentration, which does not influence a semiconductor manufacturing process. By a new B-factor analysis, the effectiveness of the 1st-stage of the cooling condensation coil was found and the chemical ion removal mechanism of the new system was solved. The new system can remove both chemical contaminants of the water-solube and water-insolube variety. This new system can operate at almost the same initial and running costs as the conventional air-conditioning system without chemical contaminant countermeasures
Keywords :
air conditioning; clean rooms; AMC; B-factor analysis; air-conditioning system; airborne molecular contaminants removal; chemical contaminant removal; chemical ion removal mechanism; clean room; cooled-type 2-stage high-speed air washer method; cooling condensation coil; semiconductor manufacturing; Chemical analysis; Chemical processes; Coils; Cooling; Costs; Filtering; Filters; Manufacturing processes; Production facilities; Semiconductor device manufacture;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Semiconductor Manufacturing, 2000. Proceedings of ISSM 2000. The Ninth International Symposium on
Conference_Location :
Tokyo
ISSN :
1523-553X
Print_ISBN :
0-7803-7392-8
Type :
conf
DOI :
10.1109/ISSM.2000.993670
Filename :
993670
Link To Document :
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