DocumentCode
2387248
Title
Development of new wastewater treatment equipment for silicon wastewater
Author
Iinuma, Hirofumi ; Tsuihiji, Motoyuki
Author_Institution
Sanyo Electr. Co. Ltd., Gunma, Japan
fYear
2000
fDate
2000
Firstpage
301
Lastpage
304
Abstract
We have succeeded to develop the new wastewater treatment equipment for silicon wastewater drained from the back grinding process or dicing process. It is based on a new method consisting of a water tank and filtering unit. In this equipment, collected wastewater is concentrated in the water tank then filtered at the filtering unit where at the same time silicon sludge floating in the water is constantly removed by a suction pump. It is quite innovating since such treated water is reusable. It also facilitates maintenance of the equipment because of its much simpler structure compared to existing equipment, resulting in less running costs and less power consumption
Keywords
environmental factors; filtration; recycling; water; H2O; Si; back grinding process; dicing process; filtering; filtration method; power consumption; running cost; silicon sludge; silicon wastewater; suction pump; wastewater treatment equipment; Costs; Filtering; Filtration; Manufacturing processes; Optical filters; Recycling; Semiconductor device manufacture; Silicon; Wastewater treatment; Water conservation;
fLanguage
English
Publisher
ieee
Conference_Titel
Semiconductor Manufacturing, 2000. Proceedings of ISSM 2000. The Ninth International Symposium on
Conference_Location
Tokyo
ISSN
1523-553X
Print_ISBN
0-7803-7392-8
Type
conf
DOI
10.1109/ISSM.2000.993673
Filename
993673
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