• DocumentCode
    2387248
  • Title

    Development of new wastewater treatment equipment for silicon wastewater

  • Author

    Iinuma, Hirofumi ; Tsuihiji, Motoyuki

  • Author_Institution
    Sanyo Electr. Co. Ltd., Gunma, Japan
  • fYear
    2000
  • fDate
    2000
  • Firstpage
    301
  • Lastpage
    304
  • Abstract
    We have succeeded to develop the new wastewater treatment equipment for silicon wastewater drained from the back grinding process or dicing process. It is based on a new method consisting of a water tank and filtering unit. In this equipment, collected wastewater is concentrated in the water tank then filtered at the filtering unit where at the same time silicon sludge floating in the water is constantly removed by a suction pump. It is quite innovating since such treated water is reusable. It also facilitates maintenance of the equipment because of its much simpler structure compared to existing equipment, resulting in less running costs and less power consumption
  • Keywords
    environmental factors; filtration; recycling; water; H2O; Si; back grinding process; dicing process; filtering; filtration method; power consumption; running cost; silicon sludge; silicon wastewater; suction pump; wastewater treatment equipment; Costs; Filtering; Filtration; Manufacturing processes; Optical filters; Recycling; Semiconductor device manufacture; Silicon; Wastewater treatment; Water conservation;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Semiconductor Manufacturing, 2000. Proceedings of ISSM 2000. The Ninth International Symposium on
  • Conference_Location
    Tokyo
  • ISSN
    1523-553X
  • Print_ISBN
    0-7803-7392-8
  • Type

    conf

  • DOI
    10.1109/ISSM.2000.993673
  • Filename
    993673