DocumentCode :
2387248
Title :
Development of new wastewater treatment equipment for silicon wastewater
Author :
Iinuma, Hirofumi ; Tsuihiji, Motoyuki
Author_Institution :
Sanyo Electr. Co. Ltd., Gunma, Japan
fYear :
2000
fDate :
2000
Firstpage :
301
Lastpage :
304
Abstract :
We have succeeded to develop the new wastewater treatment equipment for silicon wastewater drained from the back grinding process or dicing process. It is based on a new method consisting of a water tank and filtering unit. In this equipment, collected wastewater is concentrated in the water tank then filtered at the filtering unit where at the same time silicon sludge floating in the water is constantly removed by a suction pump. It is quite innovating since such treated water is reusable. It also facilitates maintenance of the equipment because of its much simpler structure compared to existing equipment, resulting in less running costs and less power consumption
Keywords :
environmental factors; filtration; recycling; water; H2O; Si; back grinding process; dicing process; filtering; filtration method; power consumption; running cost; silicon sludge; silicon wastewater; suction pump; wastewater treatment equipment; Costs; Filtering; Filtration; Manufacturing processes; Optical filters; Recycling; Semiconductor device manufacture; Silicon; Wastewater treatment; Water conservation;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Semiconductor Manufacturing, 2000. Proceedings of ISSM 2000. The Ninth International Symposium on
Conference_Location :
Tokyo
ISSN :
1523-553X
Print_ISBN :
0-7803-7392-8
Type :
conf
DOI :
10.1109/ISSM.2000.993673
Filename :
993673
Link To Document :
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