DocumentCode :
2387263
Title :
Ultra clean process gas recycling system for plasma process using krypton and xenon
Author :
Ohshima, Ichiro ; Ishihara, Yoshio ; Akutsu, Isao ; Ohmi, Tadahiro
Author_Institution :
Dept. of Electron. Eng., Tohoku Univ., Sendai, Japan
fYear :
2000
fDate :
2000
Firstpage :
305
Lastpage :
308
Abstract :
Introduction of rare Kr(Xe) gases into ULSI mass production requires the recycling of exhaust gases. We describe a gas pumping system that enables efficient recycling of Kr and Xe gases. A newly developed screw pump is able to exhaust without involving the atmosphere in its exhaust gases. Moreover, this screw pump needs a smaller volume of purge gases to realize clean pumping than conventional dry pumps. A novel bellows pump can compress recycle gases without involving the atmosphere. These pumping systems enable ultra clean process gas recycling system for the plasma process using krypton and xenon
Keywords :
ULSI; krypton; recycling; sputter etching; vacuum pumps; xenon; Kr; ULSI mass production; Xe; bellows pump; clean pumping; gas pumping system; plasma process; purge gases; recycle gas compression; screw pump; ultra clean process gas recycling system; Atmosphere; Gases; Oxidation; Plasma applications; Plasma density; Plasma materials processing; Plasma sources; Plasma temperature; Recycling; Xenon;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Semiconductor Manufacturing, 2000. Proceedings of ISSM 2000. The Ninth International Symposium on
Conference_Location :
Tokyo
ISSN :
1523-553X
Print_ISBN :
0-7803-7392-8
Type :
conf
DOI :
10.1109/ISSM.2000.993674
Filename :
993674
Link To Document :
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