Approach for environmental standard with etch tools

Author

Fukasawa, Kazuo ; Kitoku, Toshihiko ; Kobayashi, Atsushi ; Hirayama, Yusuke ; Saito, Masashi ; Nagaseki, Kazuya

Author_Institution

ES Dev. Dept., Tokyo Electron Yamanashi Ltd., Japan

fYear

2000

fDate

2000

Firstpage

309

Lastpage

312

Abstract

In order to reduce electrical power usage and the consumption of PFCs, we have researched three kinds of techniques. The first is intermittent operation of dry pumps. The next is chiller with a new refrigeration system. The technique is a gas circulation system. The first technique, intermittent pump operation, results in 51.6% reduction in carbon dioxide to be emitted for the use of energy, which includes electrical energy, nitrogen and cooling water. Next, the new Chiller conserves 68% of the electrical energy at maximum. The gas circulation system can mark 50-70% reduction in the usage of process gases, and this leads to approximately 75% reduction in PFCs emissions

Keywords

carbon compounds; environmental factors; power consumption; refrigeration; sputter etching; C₄F₈; CO₂; N₂; PFC consumption reduction; dry pumps; electrical power usage reduction; environmental standard; etch tools; gas circulation system; intermittent pump operation; refrigeration; Cooling; Electrons; Etching; Gases; Nitrogen; Power engineering and energy; Refrigerants; Refrigeration; Temperature control; Valves;

fLanguage

English

Publisher

ieee

Conference_Titel

Semiconductor Manufacturing, 2000. Proceedings of ISSM 2000. The Ninth International Symposium on

Conference_Location

Tokyo

ISSN

1523-553X

Print_ISBN

0-7803-7392-8

Type

conf

DOI

10.1109/ISSM.2000.993675

Filename

993675