DocumentCode
2387350
Title
Development of ozonated ultrapure water supplying system using direct-dissolving method
Author
Tsukamoto, Kazumi ; Mizuniwa, Tetsuo ; Ida, Jun-ichi ; Ota, Osamu ; Morita, Hiroshi
Author_Institution
Res. & Dev. Dept, UPW Anal. & Wet Process Technol. Team, Tochigi, Japan
fYear
2000
fDate
2000
Firstpage
325
Lastpage
328
Abstract
A new ozonated ultrapure water (O3-UPW) supplying system has been established. In the new O3-UPW supplying system, a direct dissolving method that can supply O3-UPW to many separated points of use from a single unit has been employed. In this system, ozone-containing gas is directly introduced in ultrapure water (direct dissolving) and the water/gas mixture is transported to many points of use through a piping system. At each point of use, bubbles in water/gas mixture are separated and O3-UPW without bubbles is supplied to the cleaning equipment. The concentration of dissolved ozone in water rapidly decreases because of self-decomposition. On the other hand ozone in the gas phase is more stable than in the water phase and ozone in the bubbles (gas phase) becomes dissolved in the water while transported through the piping system. As a result; O3-UPW with the ozone concentration of higher than 5 ppm is supplied to the cleaning equipment that is installed at distant places as far as 100 m from ozone gas introducing point. We have provided the new system in one of the latest LCD fabrication plants, which is presently in operation
Keywords
dissolving; environmental factors; integrated circuit manufacture; ozone; surface cleaning; water; 100 m; LCD fabrication plants; O3-H2O; O3-UPW supplying system; cleaning equipment; direct-dissolving method; dissolved ozone concentration; ozonated ultrapure water supplying system; piping system; self-decomposition; water/gas mixture; Biomembranes; Chemical processes; Dissolved gas analysis; Fabrication; Green cleaning; Impurities; Large scale integration; Production systems; Temperature; Transportation;
fLanguage
English
Publisher
ieee
Conference_Titel
Semiconductor Manufacturing, 2000. Proceedings of ISSM 2000. The Ninth International Symposium on
Conference_Location
Tokyo
ISSN
1523-553X
Print_ISBN
0-7803-7392-8
Type
conf
DOI
10.1109/ISSM.2000.993679
Filename
993679
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