DocumentCode :
2387558
Title :
Observation of Single Electron Tunneling and Ballistic Transport in Twin Silicon Nanowire MOSFETs (TSNWFETs) Fabricated by Top-Down CMOS Process
Author :
Cho, Keun Hwi ; Suk, Sung Dae ; Yeoh, Yun Young ; Li, Ming ; Yeo, Kyoung Hwan ; Kim, Dong-Won ; Hwang, Sung Woo ; Park, Donggun ; Ryu, Byung-Il
Author_Institution :
R&D Center, Samsung Electron. Co., Yongin
fYear :
2006
fDate :
11-13 Dec. 2006
Firstpage :
1
Lastpage :
4
Abstract :
the authors report transport experiments on gate-all-around (GAA) TSNWFETs fabricated by top-down CMOS processes. The nanowire with 45 nm gate length exhibits single electron tunneling, and the total capacitance extracted from the measured data is in good agreement with the self-capacitance of an ideal cylinder. The nanowire with 125 nm gate length shows conductance quantization suggesting ballistic transport. The temperature dependence of the conductance steps is consistent with the crossover from classical to ballistic
Keywords :
MOSFET; ballistic transport; nanowires; tunnelling; CMOS process; TSNWFET; ballistic transport; conductance quantization; single electron tunneling; twin silicon nanowire MOSFET; Ballistic transport; CMOS process; Capacitance measurement; Data mining; Electrons; Length measurement; MOSFETs; Quantization; Silicon; Tunneling;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting, 2006. IEDM '06. International
Conference_Location :
San Francisco, CA
Print_ISBN :
1-4244-0438-X
Electronic_ISBN :
1-4244-0439-8
Type :
conf
DOI :
10.1109/IEDM.2006.346839
Filename :
4154258
Link To Document :
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